"Optical Methods for 3-D Nanostructure
Metrology" by
Dr. Bryan M. Barnes
Friday, November 08,
2013 11:00 AM to 12:00 PM
CREOL Room 102
CREOL Room 102
Dr. Bryan M. Barnes
Physical Measurement Laboratory
National Institute of Standards and Technology
Abstract:
Our research at NIST applies
physics fundamental to optical scattering in order to enhance deep
sub-wavelength nanoscale measurements, often on the scale of 1/10th the
wavelength or less. Experimental methods have been developed that are
qualitatively sensitive to sub-nanometer changes in line width for example
through tailoring of the illumination angle, polarization, and focus position.
Quantitative dimensional measurements are being performed using parametric
models of the full geometry as inputs to rigorous electromagnetic simulations.
These models are used to determine a best set of parameters that yields correct
simulation-to-experiment matching of the measured scattering even from features
with dimensions well below the conventional Rayleigh resolution limit.
These advances are being
applied to two key challenges in the semiconductor manufacturing: defect
metrology and critical dimension metrology. The optical signal from a 20
nm-wide patterned defect must be identified within a 450 mm wafer while
maintaining speeds required in high-volume manufacturing. Limitations to parametric
fitting necessitate developing new techniques for embedding values and
uncertainties from other instruments to yield the best possible result.
Ensuring the extensibility of optical methods for metrology has generated for
defects the development of novel illumination and collection optimization
solutions and for CD metrology hybrid metrology for embedding additional values
and uncertainties from different instruments to optimize these parametric fits.
As these solutions are being embraced by the industry, their potential
limitations are constantly being evaluated in order to develop the next set of
answers to these critical challenges.
Biography:
Dr. Bryan Barnes is a
Physicist at the National Institute of Standards and Technology in
Gaithersburg, MD. Over the last eight years, he has been an author or co-author
to several papers on patterned defect inspection, hybrid metrology, critical
dimension optical metrology, and overlay metrology. He is a Principal Developer
of “Quantitative Hybrid Metrology,” recently recognized with a 2013 R&D 100
Award. Dr. Barnes was an NRC Post-doctoral Fellow at NIST from 2005-2007 after
attaining his Ph.D. from the University of Wisconsin-Madison in 2004.
For more information:
Dr. Bahaa E. A. Saleh
Dean & Director, Professor
of Optics
407-882-3326
besaleh @ creol . ucf . edu
No comments:
Post a Comment